JPH0373236B2 - - Google Patents

Info

Publication number
JPH0373236B2
JPH0373236B2 JP57019328A JP1932882A JPH0373236B2 JP H0373236 B2 JPH0373236 B2 JP H0373236B2 JP 57019328 A JP57019328 A JP 57019328A JP 1932882 A JP1932882 A JP 1932882A JP H0373236 B2 JPH0373236 B2 JP H0373236B2
Authority
JP
Japan
Prior art keywords
members
base
moving members
fine movement
moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57019328A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58139681A (ja
Inventor
Tooru Tojo
Kazuyoshi Sugihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57019328A priority Critical patent/JPS58139681A/ja
Priority to DE8282108932T priority patent/DE3278959D1/de
Priority to EP82108932A priority patent/EP0085745B1/en
Priority to US06/429,230 priority patent/US4455501A/en
Publication of JPS58139681A publication Critical patent/JPS58139681A/ja
Publication of JPH0373236B2 publication Critical patent/JPH0373236B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/0095—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing combined linear and rotary motion, e.g. multi-direction positioners
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
    • H02N2/021—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors using intermittent driving, e.g. step motors, piezoleg motors
    • H02N2/023—Inchworm motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/10—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing rotary motion, e.g. rotary motors
    • H02N2/101—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing rotary motion, e.g. rotary motors using intermittent driving, e.g. step motors

Landscapes

  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Analytical Chemistry (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Units (AREA)
JP57019328A 1982-02-09 1982-02-09 回転微動機構 Granted JPS58139681A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57019328A JPS58139681A (ja) 1982-02-09 1982-02-09 回転微動機構
DE8282108932T DE3278959D1 (en) 1982-02-09 1982-09-27 Fine rotation mechanism
EP82108932A EP0085745B1 (en) 1982-02-09 1982-09-27 Fine rotation mechanism
US06/429,230 US4455501A (en) 1982-02-09 1982-09-30 Precision rotation mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57019328A JPS58139681A (ja) 1982-02-09 1982-02-09 回転微動機構

Publications (2)

Publication Number Publication Date
JPS58139681A JPS58139681A (ja) 1983-08-19
JPH0373236B2 true JPH0373236B2 (en]) 1991-11-21

Family

ID=11996336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57019328A Granted JPS58139681A (ja) 1982-02-09 1982-02-09 回転微動機構

Country Status (3)

Country Link
EP (1) EP0085745B1 (en])
JP (1) JPS58139681A (en])
DE (1) DE3278959D1 (en])

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6077685A (ja) * 1983-10-04 1985-05-02 Shoketsu Kinzoku Kogyo Co Ltd ブレ−キ装置
JPS60118072A (ja) * 1983-11-30 1985-06-25 Toshiba Corp 回転微動機構
JPH063788B2 (ja) * 1983-12-30 1994-01-12 株式会社島津製作所 微動回転駆動装置
JPS60145614A (ja) * 1984-01-10 1985-08-01 Toshiba Corp 回転微動機構
DE3415220C2 (de) * 1984-04-21 1986-02-20 Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5000 Köln Drehschwingantrieb für einen Ringlaserkreisel
JPH0614789B2 (ja) * 1984-06-25 1994-02-23 株式会社東芝 テーブル微動方法およびこの方法を用いた微動装置
DE3610540A1 (de) * 1986-03-27 1987-10-01 Kernforschungsanlage Juelich Bewegungseinrichtung zur mikrobewegung von objekten
DE3814616A1 (de) * 1988-04-29 1989-11-09 Fraunhofer Ges Forschung Mikromanipulator zur bewegung von objekten
GB9205665D0 (en) * 1992-03-16 1992-04-29 Fisons Plc Piezo-electric motor
DE10156836B4 (de) * 2001-11-20 2004-01-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Erzeugung einer rotatorischen Bewegung und Verwendung derselben
WO2004061988A1 (ja) 2002-12-27 2004-07-22 Fujitsu Limited 微小駆動ユニットおよび記録媒体駆動装置
NL1041790B1 (en) * 2016-04-04 2017-10-10 Hubertus Leonardus Mathias Marie Janssen Ir Cryogenic Sample Rotator
CN107015573B (zh) * 2017-03-20 2020-05-29 歌尔科技有限公司 电磁式运动平台的控制方法及系统

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5112497B1 (en]) * 1971-04-21 1976-04-20
US3887811A (en) * 1971-10-08 1975-06-03 Radiant Energy Systems Electro mechanical alignment apparatus for electron image projection systems
FR2367315A1 (fr) * 1976-10-11 1978-05-05 Commissariat Energie Atomique Dispositif de deplacement piezopneumatique

Also Published As

Publication number Publication date
JPS58139681A (ja) 1983-08-19
DE3278959D1 (en) 1988-09-29
EP0085745A2 (en) 1983-08-17
EP0085745B1 (en) 1988-08-24
EP0085745A3 (en) 1986-03-19

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